DELTA台達201 T3F3F4
This course is to let students learn the fundamental knowledge of nano-lithography. There will be materials for students to understand the current trend and know-how of the advanced optical lithography equipment or materials. In this course, we will describe the things that drive the limits of optical lithography and study optical imaging from the perspective of diffraction, and the advanced development of the new lithography technology. The goal is to develop a fundamental understanding of concepts of diffraction, Fourier spectral analysis, coherency theory, lens interaction, aberration concepts, image enhancement, and automatic micro-imaging measurement.
Course keywords: Nano-Lithography, Semiconductor process, diffraction, optics, Fourier transform, 奈米微影, 半導體製程, 繞射, 光學, 復立葉轉換 課程說明(Course Description) In this course, it covers the capabilities and challenges in optical lithography using practical approaches to understand basic scientific and engineering principles. Using fundamental concepts, practical examples, and optical demonstrations, the limits of optical lithography are defined and explored. As optical lithography is pushed beyond classical limits, an understanding of imaging from a dimensional description (of the mask and wafer) as well as a spatial frequency perspective (of the optics) becomes necessary.. The goal is to develop a fundamental and intuitive understanding of topics related to diffraction by a photomask, collection by an optical system, and imaging into a photoresist. Fourier spectral analysis, coherency theory, lens interaction, aberration concepts, and image enhancement are describe in fairly simple terms and several optical demonstrations help develop the concepts. 教科書與參考書籍(Text books and references) 1. Optical Lithography; Here is Why” Burn J. Lin, SPIE Press 2010 2. Microlithography: Science and Technology, Third Edition CRC Press, 2013 Kazuaki Suzuki, Bruce Smith 週次 課程進度、內容、主題 1 Syllabus introduction and introduction, semiconductor industry overview 2 Introduction to optical lithography 3 Electromagnetic radiation, Plane waves, Intensity 4 Diffraction, Fourier transforms; Aerial image formation 5 Partial coherence; Aberrations 6 Flare and defocus 7 Vector imaging, image metrics; Standing waves 8 Swing curves; Top and bottom ARCs 9 Midterm 10 Chemistry of photoresisit Materials. 11 RET – Optical proximity correction 12 Focus exposure, process window, DOF, MEEF 13 EUV lithography I 14 EUV lithography II 15 Metrology system 16 Advanced lithography I: X-ray lithography, LIGA, interference lithography. 17 Advanced lithography II: E-beam lithography 18 Final
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